Steinmesse & Stollberg DUFA V – Lithography press

The DUFA V proofing press, manufactured by Steinmesse & Stollberg in the 1960s, represents a refined stage in the development of lithographic offset printing technology. Designed primarily for proofing and short-run production, the press reflects a period when precision, reliability, and control were becoming central to both industrial printing and artistic practice.

As a lithographic offset press, the DUFA V operates on the principle that image and non-image areas exist on the same flat surface. Ink adheres only to the image areas, while water repels it from the rest. The image is first transferred (or “offset”) from the plate to a rubber blanket cylinder, and from there onto the paper. This indirect printing method allows for finer detail, more even ink distribution, and reduced wear on the printing surface compared to direct printing techniques.

A notable feature of the DUFA V is its versatility: it can print both from traditional lithographic stones and from metal plates. This capability bridges older and newer lithographic practices, allowing printers to work across techniques and materials within the same machine.

The DUFA V was engineered as a proofing press, meaning it was intended to produce accurate test prints before full-scale production. Such presses were essential in ensuring correct registration, tonal balance, and image clarity. At the same time, their manageable size and precise control made them well suited for workshop environments, including artist studios and smaller print shops.

Characterized by solid mechanical construction and careful calibration, the press offers operators a high degree of sensitivity in adjusting pressure, inking, and dampening. This makes it possible to achieve subtle tonal variations and consistent results—qualities highly valued in both commercial proofing and fine art printmaking.

Today, surviving examples of the DUFA V stand as testimony to mid-20th-century engineering in the printing industry. When maintained and kept in operation, they continue to demonstrate the enduring relevance of offset lithography as both a technical process and a creative medium.